Nanolithography on the Electron Beam Resist using the Scanning Probe Microscope Cantilever
نویسندگان
چکیده
منابع مشابه
Studying of various nanolithography methods by using Scanning Probe Microscope
The Scanning Probe Microscopes (SPMs) based lithographic techniques have been demonstrated as an extremely capable patterning tool. Manipulating surfaces, creating atomic assembly, fabricating chemical patterns, imaging topography and characterizing various mechanical properties of materials in nanometer regime are enabled by this technique. In this paper, a qualified overview of diverse lithog...
متن کاملStudying of various nanolithography methods by using Scanning Probe Microscope
The Scanning Probe Microscopes (SPMs) based lithographic techniques have been demonstrated as an extremely capable patterning tool. Manipulating surfaces, creating atomic assembly, fabricating chemical patterns, imaging topography and characterizing various mechanical properties of materials in nanometer regime are enabled by this technique. In this paper, a qualified overview of diverse lithog...
متن کاملstudying of various nanolithography methods by using scanning probe microscope
the scanning probe microscopes (spms) based lithographic techniques have been demonstrated as an extremely capable patterning tool. manipulating surfaces, creating atomic assembly, fabricating chemical patterns, imaging topography and characterizing various mechanical properties of materials in nanometer regime are enabled by this technique. in this paper, a qualified overview of diverse lithog...
متن کاملthe scanning electron microscope
it is only thirteen years since the scanning electron microscope has been available commercially. yet, even in this short period of time, this instrument has been a powerful tool in the investigation of topography, electrical and magnetic properties, crystal structure, cathodoluminescent characteristics etc. of solid specimens. today, this type of microscope has opened its place alongside the c...
متن کاملParallel electron-beam-induced deposition using a multi-beam scanning electron microscope
Lithography techniques based on electron-beam-induced processes are inherently slow compared to light lithography techniques. The authors demonstrate here that the throughput can be enhanced by a factor of 196 by using a scanning electron microscope equipped with a multibeam electron source. Using electron-beam induced deposition with MeCpPtMe3 as a precursor gas, 14 14 arrays of Pt-containing ...
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ژورنال
عنوان ژورنال: ITB Journal of Sciences
سال: 2010
ISSN: 1978-3043
DOI: 10.5614/itbj.sci.2010.42.1.1